Laser holographic lithography 5 and direct-laser-writing (DLW) techniques 6 are two useful approaches. Laser holographic lithography uses the interference of several coherent laser beams to define ...

According to Cymer, this set-up has twice the conversion efficiency of other laser–fuel combinations. Figure 3: EUV sources for lithography applications based on laser- (left) or discharge ...

For example, a milliwatt laser focus translated through the 3D volume of a holographic photopolymer writes an optical waveguide with a ... We have also created intererence lithography systems capable ...

EUV lithography tools consume such vast amounts of power because they rely on high-energy laser pulses to evaporate tiny tin droplets (at 500,000ºC) to form a plasma that emits 13.5-nanometer light.